3 Wave IR WAFERSKAN Ellipsometer Model L3W15ir633.830.1550 
shown with optional camera and polarizer drum

ir ellipsometers description
1550 nm IR Laser  Ellipsometers give the user greater versatility in thickness and refractive index measurement of thin transparent and semi-transparent films. IR Laser light sources have ample light intensity for increased measurement accuracy of absorbing and rough scattering films. Laser sources have the added advantage of being spectrally precise, more stable and long lasting. Their use permits optimum instrument design in optics, detectors and other components so that measurements can be made highly accurate. Separate laser sources also offer backup reliability important to continuous operation.

• Measure thick films without thickness period ambiguity
• Get refractive index in near period regions
• Measure highly absorbing films that become transparent in the IR
• Get dispersion with two or three values of refractive index
• Analyze difficult to measure films like Poly, Plasma Nitride and Silicon on Sapphire
• Improves modeling results using more measured data for complicated structures 
  

1550 nm IR Laser Ellipsometers use our traditional rotating analyzer for automatic measurement of film thickness and refractive index. They are equipped with a two stage detector for measuring both visible and  infra-red light. The variable angle feature gives more flexibility to analyze more difficult and near period films. These ellipsometers are available in manual hand positioning pedestal stage and automatic (Imaging WAFERSKAN) stage models.

 features

Flexible angle of incidence: Choice of either "standard" 70° angle or optional angles permits more accurate measurements over a wide variety of films than is possible with only one angle setting. Enables thick film thickness (thickness order) to be measured.

Dual Mode Polarization: Improves accuracy because every measurement is made using circularly and linearly polarized light. Computer uses both modes and delivers the best answer.

Built-in Alignment: Axis of rotation of incidence arms is in the sample plane. No need for alignment prisms, or need for sample realignment.

Sample Stage: Eight inch (200mm) hand positioning pedestal table can accept a 300mm wafer.

Rotating Analyzer: Gives a three-second measurement... rugged --- only one moving part ... no gears to wear or create backlash. 144 data points give accurate results.

Sample Monitor: Combination microscope (for surface viewing)/tilt monitor (for checking sample out-of-flatness) with built-in illuminator --- standard.

Ready to go: Built-in optical reference encoder eliminates the need for initialization --- ever!

Software Flexibility: LGEMP 4 Layer Absorbing Program for Windows and LMOD 4 Layer Simultaneous Modeling Program for Windows are included standard with Multiwave Ellipsometers. 

 additional laser light sources available for IR Ellipsometers:

       405 nm Laser Diode
       544 nm HeNe Gas Laser
       633 nm HeNe Gas Laser standard
       830 nm Laser Diode
       1523 nm Laser Diode
 1550 nm Laser Diode standard

 

two wave ir ellipsometer models
Variable Angle	WAFERSKAN	Description
L2W16ir405.1550 $78K	L2W15ir405.1550 $112K	Two Wavelength Rotating Analyzer Ellipsometer with 405 nm and 1550 nm Laser Diodes.
L2W16ir544.1550 $68K	L2W15ir544.1550 $103K	Two Wavelength  Rotating Analyzer Ellipsometer with 544 nm HeNe Gas Laser and 1550 Laser Diode.
L2W16ir633.1550 $65K	L2W15ir633.1550 $100K	Two Wavelength Rotating Analyzer Ellipsometer with 633 nm HeNe Gas Laser and 1550 nm Laser Diode. This is the standard model.
L2W16ir830.1550 $73K	L2W15ir830.1550 $108K	Two Wavelength  Rotating Analyzer Ellipsometer with 830 nm  and 1550 nm Laser Diodes.
three wave ir ellipsometer models
L3W16ir405.544.1550 $85K	L3W15ir405.544.1550 $120K	Three Wavelength Rotating Analyzer Ellipsometer with 405 nm laser diode, 544 nm HeNe Gas and 1550 nm Laser Diode.
L3W16ir405.633.1550 $82K	L3W15ir405.633.1550 $117K	Three Wavelength  Rotating Analyzer Ellipsometer with 405 nm Laser Diode 544 nm HeNe Gas Laser,  and 1550 nm Laser Diode.
L3W16ir405.830.1550 $90K	L3W15ir405.830.1550 $125K	Three Wavelength Rotating Analyzer Ellipsometer with 405 nm , 830 nm  and 1550 nm Laser Diodes.
L3W16ir544.633.1550 $71K	L3W15ir544.633.1550 $106K	Three Wavelength  Rotating Analyzer Ellipsometer with 544 nm, 633 nm HeNe Gas Lasers and 1550 nm Laser Diode.
L3W16ir544.830.1550 $80K	L3W15ir544.830.1550 $115K	Three Wavelength Rotating Analyzer Ellipsometer with 544 nm HeNe Gas laser, 830 nm  and 1550 nm Laser Diodes.
L3W16ir633.830.1550 $77K	L3W15ir633.830.1550 $112K	Three Wavelength  Rotating Analyzer Ellipsometer with 633 nm HeNe Laser, 830 nm and 1550 nm Laser Diodes.
L3W16ir633.1523.1550 $82K	L2W15ir633.1523.1550 $117K	Three Wavelength Rotating Analyzer Ellipsometer with 633 nm HeNe Gas laser, 1523 nm  and 1550 nm Laser Diodes.

optional manual stage accessories  

 Linear Rotary Stage L116LRS 
This linear rotary stage is moved by hand in a linear and 360º rotary motion so that different areas on the sample can be conveniently measured. The 8" sample table can accept up to 300mm wafers and has 150 mm left to right cross travel and can be scale read to 1 mm. The L116LRS accepts sample thickness up to 1/2 inch and has provision for vacuum and tilt up to 1 degree. $4K

 XY Linear Rotary Stage  L116LRSY
This stage is same as the L116LRS except ± 1" micrometer front to back travel in Y is added. The added Y coordinate motion facilities measurement of a XY rectangular pattern.  $5K

 optional accessories  

Video Monitor L115VM 
Permits monitoring a wafer pattern on a 9" CRT screen. $5K

Polarizer Drum LPD (see photo above)
Polarizer drum divided 0 to 360º, settable to 0.1º, containing a Glan Thompson prism added to the polarizer arm of the ellipsometer.  Used to change the azimute of the linear polarization for certain in-line transmission measurements of transparent materials.  $2K

ir ellipsometer  specifications 

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