The model LSE-WS Stokes WAFERSKAN Ellipsometer is a high speed film thickness mapping system measuring one site per second including stage travel! It uses patented StokesMeter™ technology to give tilt-free, focus free, 2D/3D color thickness and index maps on any size wafer up to 300mm. Easy to use and affordably priced under $50K in the USA, the LSE-WS is a outstanding value in a high precision imaging ellipsometer. 
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The model LSE Stokes Ellipsometer is based on advanced StokesMeter™ technology (winner of Photonics Spectra and R&D 100 best new products awards). The unit's basic design offers unprecedented ease of use, precision and instantaneous measurement at a cost under $20K in the USA.
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The LSE –TRAVELER is designed to be shipped or checked as airline luggage, the rugged LSE-TRAVELER fits into a airline safe foam filled travel case together with sample table and a PCMCIA interfaced notebook computer that is ready for measurement right out of the case. Under $28K
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The L115S300 Stokes WAFERSKAN Ellipsometer's high speed film thickness mapping system measures 49 sites in 49 seconds! It is a fast instrument for thin film visualization giving tilt-free, focus-free, automatic  2D/3D color thickness and index images of the sample surface. The model L115S300 maps up to 300mm wafers.
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The L116S300 with a manual hand positioning stage makes measurements of film thickness and film refractive index in milliseconds. The variable angle capability determines thicker film thickness and gives refractive index measurements over a wider thickness range. The unit is upgradeable to WAFERSKAN, Two and Three Wavelength.
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The model L104ST is a super fast, reliable, no moving parts ellipsometer that is ideal for measuring the rapid growing or etching of films in situ within your reactor. Get precise real time measurements of early film growth on a bare substrate to sub-angstrom precision. Determine the exact end point during an etch. Polarizer and analyzer modules mount onto window flanges outside your CVD, electron-beam, MBE, sputtering reactor or chamber. Priced at $36K in the USA.
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The Two & Three Wavelength Ellipsometers use laser sources to analyze difficult to measure films. They give refractive index results in near period regions, and measure the thickness of thicker films, and offer many of the advantages of spectroscopic ellipsometers without the complexity. Priced from $35K in the USA.
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The Two & Three Wavelength IR Ellipsometers use 1550 nm IR together with visible laser sources to measure films like amorphus silicon and polysilicon layers that are highly absorbing or even opaque to visible light. They give refractive index results in near period regions, and measure the thickness of thicker films, and offer many of the advantages of spectroscopic ellipsometers without the complexity. Priced from $65K in the USA.
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The model L117F300 is a variable angle traditional manual nulling ellipsometer. Measurements are made in minutes by manually rotating the polarizer and analyzer drums then entering the readings into a PC. The variable angle type frame structure permits this model to be factory upgraded to a  Automatic, WAFERSKAN, or Multiwave ellipsometer. Priced under $25K in the USA.
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The model L115WH Wafer Handler permits unattended automatic measurement of up to 25 wafers from a cassette. The random access indexer on the Wafer Handler is ultra clean with the mechanism fully contained within the housing so there are no moving parts near the wafer. The motion of the arm is reliable, clean and gentle.
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Software and hardware interface upgrades are available for older ellipsometer models L116, A, B, and C. Software programs LGEMP and LMOD for Windows VISTA/XP/2000 give enhanced ellipsometer performance. WAFERSKAN models L115 type can be upgraded to IBM PC or compatible Pentium computers for 2D/3D color mapping and imaging. Prices range from $975 to $4K depending on upgrade.  
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